Argon DC Glow Plasma 氩直流辉光等离子体
Direct current hot cathode plasma glow discharge chemical vapor deposition (DC-HCPCVD) is a new method to deposit high quality diamond films with high growth rate.
直流热阴极辉光放电等离子体化学气相沉积法是我们建立的快速沉积高品质金刚石膜的新方法。
With the micro-discharge array, the glow discharge plasmas with high-pressure and high-current density can be formed to make DC plasma display panel.
它产生的高气压高电流密度辉光放电等离子体能够用来制作平面等离子体显示或光源。
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